June 2026 Applied Materials introduced the Centris™ Spectral™ SiN ALD deposition system and Producer™ Selectra™ Mo Etch platform to support advanced 3D logic and NAND manufacturing. The new deposition technologies improve film uniformity and enable next-generation AI semiconductor production.
June 2026 AIXTRON announced that MIT Lincoln Laboratory invested in two Hyperion 300 mm CVD systems to accelerate research and development of gallium nitride (GaN) power devices and two-dimensional semiconductor materials. The investment expands advanced semiconductor deposition research capabilities.
December 2025 ASM International completed the acquisition of Axus Technology, a supplier of chemical mechanical polishing (CMP) equipment for compound semiconductor manufacturing. The acquisition broadens ASM's process portfolio complementary to its leading ALD and epitaxy technologies.