Photolithography Equipment Market Size, Share & Trends Analysis Report By Process (Ultraviolet, Deep Ultraviolet, Extreme Ultraviolet), By Application (Front-end, Back-end), By Light Source (Mercury Lamp, Fluorine Laser, Excimer Laser, Others), By Type (EUV, DUV, I-Line, ArF, ArFi, KrF), By Wavelength (370 nm–270 nm, 270 nm–170 nm, 70 nm–1 nm), By End User (IDMS, Foundries) and By Region (North America, Europe, APAC, Middle East and Africa, LATAM) Forecasts, 2026-2034